AMAT 0041-75950 Cchemical Vapor Deposition Reactor

Description

The AMAT 0041-75950 is a Chemical Vapor Deposition (CVD) reactor, designed as a temperature-controlled heating or cooling reactor for thin-film deposition. It is used to deposit conformal and uniform films on various substrates. The reactor consists of a reaction chamber enclosed in a vacuum-sealed container, allowing precise thermal control and efficient material transfer. This equipment operates within a temperature range from room temperature to 1000°C, enabling the deposition of a variety of thin-film materials.

Specifications

• Model: 0041-75950
• Manufacturer: Applied Materials (AMAT)
• Type: Chemical Vapor Deposition (CVD) Reactor
• Temperature Range: Room temperature to 1000°C
• Compatible Substrates: Silicon, sapphire, quartz, glass
• Deposition Materials: Silicon nitride, silicon dioxide, aluminum nitride, and more
• Heating Methods: Electron bombardment, induction heating, and other sources

Features

• Temperature-Controlled Chamber:The reaction chamber is designed for precise thermal control, supporting both heating and cooling functionalities for optimal film deposition.
• Gas Control System:A gas control unit delivers an accurate amount of gas to the reaction chamber during the deposition process, ensuring precise control over the thin film's quality.
• Deposition Source:The deposition source provides a controlled supply of material to the reaction chamber, where it is deposited onto the substrate.
• Versatile Heating Sensors:The reactor is equipped with heated or cooled magnetic sensors, capable of using various heating methods such as electron bombardment and induction heating.
• Multiple Material Compatibility:The reactor is designed to deposit films on a wide range of substrates, including silicon, sapphire, quartz, and glass.
• Thin Film Materials:It can deposit a variety of thin films such as silicon nitride, silicon dioxide, and aluminum nitride, making it versatile for different applications.
• User-Friendly Design:The reactor features an intuitive computer interface and offers both automated and manual operation options for user convenience.
• Precise Control:It provides accurate control over temperature, gas flow, and deposition rates, making it ideal for a wide range of applications in the semiconductor, optoelectronic, and photomechanical industries.
• Robust Mechanical Design:Built with durable materials and a solid mechanical design, the reactor ensures safe and reliable operation.